帕纳科 X'Pert3 MRD 高分辨X射线衍射仪

新一代的 X'Pert3 MRD 和的 X'Pert3 MRD XL 将延续帕纳科高分辨衍射仪(MRD平台)长期成功的历史。新平台可靠性的增强及性能的改进提高了分析能力,同时,增加了对X射线散射研究的能力。

• 先进材料科学

• 科学和工业薄膜技术

• 半导体过程开发中的计量表征

凭借100×100 mm (X’Pert3 MRD) 或 200×200 mm (X’Pert3 MRD XL) 的全尺寸Mapping,两套系统均可以处理同样宽泛的应用领域。

帕纳科 X'Pert3 MRD 高分辨X射线衍射仪技术参数:

1、功率:3kW

2、测角仪重现性:0.0001度

3、测角仪类型:T-2T

4、五维样品台

测角仪

半径:X'Pert PRO MRD 320mm(水平)

半径:X'Pert PRO MRD XL 420mm(水平)

帕纳科 X'Pert3 MRD 高分辨X射线衍射仪系列

X’Pert3 MRD

The standard research and development version for use with thin film samples, wafers (complete mapping up to 100 mm) and solid materials. High-resolution analysis capability is improved by the outstanding accuracy of a new high-resolution goniometer using Heidenhain encoders.

X'Pert3 MRD XL

The X'Pert3 MRD XL meets all the high-resolution XRD analysis requirements of the semiconductors, thin films, and advanced materials industries. Complete wafer mapping up to 200 mm is possible. The X’Pert3 version comes with longest liftetime of incident beam components (CRISP) and maximum uptime with pneumatic shutters and beam attenuators.

By facilitating analysis of wafers of up to 300 mm in diameter, with a sophisticated, automatic wafer loader option, the X'Pert3 MRD XL becomes an advanced tool for quality control of industrial thin layered structures.

X'Pert3 Extended MRD (XL)

The X'Pert3 Extended MRD (XL) brings increased versatility to the range of X'Pert3 MRD systems. An extra PreFIX mounting platform allows mounting of an X-ray mirror and a high-resolution monochromator in-line, increasing significantly the intensity of the incident beam.

One can benefit from increased application versatility without compromise on data quality, high-resolution X-ray diffraction with high intensities, shorter measurement times for measurements such as reciprocal space mapping and rebuild from standard to extended configuration in minutes thanks to the PreFIX concept. With the 2nd generation PreFIX, reconfiguring is easy and optics positioning is more accurate than ever.

X'Pert3 MRD (XL) In-plane

With the X'Pert3 MRD (XL) system for in-plane diffraction, it becomes possible to measure diffraction from lattice planes that are perpendicular to the sample surface.

Standard and in-plane geometries on one system and a wide range of diffraction experiments on polycrystalline and highly perfect thin films, are just two of many benefits.