半导体晶圆清洗技术手册

rainman

Handbook of Semiconductor Wafer Cleaning Technology
The cleaning of semiconductor wafers has become one of the most
critical operations in the fabrication of semiconductor devices, especially
advanced ULSI silicon circuits, A considerable body of technical and
scientific literature has been published on this important subject; however,
it is widely dispersed in numerous journals and symposia proceedings. It is
the objective of this book to bring together in one volume all pertinent
knowledge on semiconductorwafer cleaning and the scientific and technical
disciplines associated directly or indirectly with this subject. The book
provides the first comprehensive and up-to-date coverage of this rapidly
evolving field. Its thirteen chapters were written by nineteen scientists who
are recognized experts in each topic.
The scope of this book is very broad, covering all aspects of wafer
cleaning. Emphasis is on practical applications in the fab combined with
authoritative scientific background information to provide a solid scientific
basisforthe understanding of the chemical and physical processes involved
in cleaning and in the analytical methods of testing and evaluation.
This user-friendly handbook has been based on lectures presented in
an intensive two-day course on wafer cleaning technology that was organized
by the editor and held in San Francisco and Princeton with the
participation of several of the chapter authors. The enthusiastic response
by the course attendees convinced us that a book treating this material in
greater depth in the format of topical overviews is indeed highly desirable,
if not urgently needed.
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